SPIE Advanced Lithography + Patterning 2027 in San Jose

SPIE Advanced Lithography + Patterning is the annual meeting point for engineers, researchers and suppliers working at the edge of semiconductor patterning. The five-day programme spans optical and extreme ultraviolet lithography, resist materials, metrology, process integration and the emerging techniques behind continued chip scaling. Technical sessions draw research groups from industry, academia and national laboratories, combining paper presentations, posters, panel discussions and short courses. The co-located exhibition connects equipment makers, materials suppliers and metrology vendors with the engineers who specify and run their tools. Set at the San Jose McEnery Convention Center in the middle of Silicon Valley, the event lets attendees pair technical work with supplier meetings and recruiting conversations. Most participants stay in downtown San Jose within walking distance of the venue, and hotels near the convention centre sell out early because of overlapping sessions and a busy show floor.